Vapour Drying Whitepaper - Handbook for Critical Cleaning

STOKE-ON-TRENT, U.K. - March 31, 2015 - PRLog -- Vapour drying technology provides guaranteed, highly effective, streak-free drying of a wide range of components.

The vapour drying process benefits from a proven method of IPA handling. It uses only fresh IPA for each cleaning batch. The method reduces contamination, improves purity and ensures repeatable, consistent cleanliness.

Process outline

The method uses a water solubilization mechanism for complete removal of water measured down to molecular level.

The technology uses IPA to absorb surface water. With an extremely low surface tension rating, the IPA permeates surface cracks, line geometries and deep trenches.

As a result the vapour dryer effectively removes moisture which other drying systems may not reach.

The IPA then rises to the surface and uniformly covers the product surface. No impurities are introduced by this process, thereby protecting the integrity of the component surface.

In the drying process the water-enriched IPA sheds off the surface of the substrate, due to the specific gravity differential of IPA and DI water. Final rinsing is then performed through continued vapour condensation.

Phil Dale
Co-contributor Handbook for Critical Cleaning
Liquid Displacement Drying Techniques

Handbook for Critical Cleaning, Second Edition – 2 Volume Set Hardcover – April 4, 2011by Barbara Kanegsberg (Editor), Edward Kanegsberg (Editor)

For further information call us on +44 (0) 1782 370400 or visit website www.laytontechnologies.com (http://www.laytontechnologies.com/semiconductor/)