Comprehensive Patent Awarded for Customized Pattern Generation

Dragon and Phoenix Software Inc. has been awarded a comprehensive patent for the creation of customized patterns by the US Patent Office. This patent covers the process and production of patterns for garments and accessories.
 
Feb. 3, 2010 - PRLog -- Already in use by bridal and couture shops, medical groups, universities and theatre groups, as well as a dedicated user base of sewing enthusiasts, designers and garment production houses, Dragon and Phoenix Software’s The Complete Clothier™ (TCC) products are now protected by comprehensive patents awarded by the US Patent Office. This software is supported by a proprietary algorithm system and interpolation engine that allows the user to define increasing levels of fit definition in fully scalable patterns. Patterns in the TCC system are not confined to predetermined sizes or limited size ranges, but instead scale for figures that range from a 3-inch doll to larger-than-life characters, little people, amputees, and special needs patients, to name a few.

The customized patterns available for the TCC system currently include garments, costumes, medical or support specialty items, purses and bags, shoes, gloves, hats, pillows, storage containers, and organizers for people, pets, home decor, etc.

More than 15,000 patterns are currently available, with more added to the pattern list each month.

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Dragon and Phoenix Software Inc. is the developer of the patented The Complete Clothier (TCC) product line. These product provide scalable custom pattern generation for garments, costumes and more.
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