Please note that any patent filed after our priority date covering the same or substantially similar invention, shall not have the priority on this invention and consequently shall not have any legal standing, under the provisions of Patents Act, 1970 of India.
The patent application discloses ‘Systems and methods for high pressure plasma discharge, system comprising at least one electrode which is fragmented into pieces and arranged to form a fragmented electrode system; at least one dielectric material placed between or parallel to electrodes or fragmented electrode systems, wherein the said electrodes or fragmented electrode systems may have same or opposite charge; and at least one power supply unit; wherein the pieces of the electrode which is fragmented can be arranged parallel or divergent or convergent to one another and are at an angle to each other or the central axis passing through the electrode.’
We hereby notify publicly and to whomsoever it may concern that in respect of the said application and the invention covered in the application, that any attempt whether successful or unsuccessful to copy, reproduce, use, recreate, import or practice the patent pending invention or any invention substantially similar to the patent pending invention, may be in contravention of law of India, and shall attract suitable legal action on Civil as well as criminal grounds, including claims of compensation and injunctions.
End users are informed herein and notified that they must buy, subscribe or use any product or process related to the said invention, only with proper authorization from the client.
- Applicant’s Patent Consultant & Agent