CLAM II Magentron Sputtering System

CLAM II: R&D PVD Magnetron Sputter Deposition System. A versatile R&D coatings platform for wide ranging thin film development.
Nov. 7, 2012 - PRLog -- CLAM II Magentron Sputtering System


Press Release: HSP022

Release date: May 2010

With immediate effect Henniker Scientific Ltd. of Warrington, England announce the release of the new Prevac CLAM II thin film deposition system featuring the motorized CLAM opening providing full, unobstructed access to the targets, substrates and ancillary devices.
The system is of UHV construction with a differentially pumped CLAM seal achieving base pressures 1E-9 mbar. It features seven UHV sputter-up 2” circular targets (RF/DC/Pulsed DC) that can operate at the focal point or vertically upwards. The system also features a shutter with in-vacuum stepper motor for step layer deposition and a two-axis motorized manipulator with two x 1 inch sample receiving stations, one positioned at the focal point and one over the vertical position.
The system is complimented by a range of add-on equipment including four position introduction chamber with halogen lamp, in-situ ion source for sample cleaning, deposition rate quartz balance, CCD camera, and residual gas analyzer. The entire system is PC controlled with dedicated MIMIC screens and deposition process editor.
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Phone:01925 210 933
Zip:WA3 6BU
Industry:Technology, Science
Location:Warrington - Cheshire - United Kingdom
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