UPW Asia To Focus on Business and Technology of Water Treatment

July 1, 2012 - PRLog -- SINGAPORE—Those attending Singapore International Water Week (SIWW) are welcome to include ULTRAPURE WATER Asia as part of their schedule.  To attend, simply come to Rooms 3001-3003 on Level 3 of the Marina Bay Sands Convention Centre and register for one or both days of the Wednesday-Thursday (July 4-5) conference.  Contact info@talloaks.com with further questions.  

UPW Asia will feature a keynote address by Mr. Harry Seah of the Singapore PUB on water development in Singapore. His presentation will be part of the Water Business Forum the morning of Wednesday, July 4. Mr. Seah is the director of the Technology and Water Quality Office in the Singapore PUB.  

The conference will also include a Technology Forum the afternoon of Wednesday, July 4, and Thursday, July 5.  It will feature presentations on key high-purity water treatment technologies by experts in the field.  Presentations will examine topics such as UV Oxidation, Membranes, Semiconductor Water Guidelines, Ultrafiltration, Particle Measurement, Desalination, Cooling Water.  

Those who attend UPW Asia 2012 can expect to learn more about the high-purity water business.  Other takeaways from the conference will include water industry trends, greater knowledge about important technologies used in high-purity water treatment, and water technology developments.

The conference is sponsored by Tall Oaks Publishing, publisher of ULTRAPURE WATER journal and INDUSTRIAL WATER TREATMENT.  This is the second year for a co-located ULTRAPURE WATER-Asia at the SIWW.  

Conference information, a schedule, and on-line registration are available at http://www.ultrapurewater.com.  For questions, contact info@talloaks.com.  Conference registration discounts are available to groups of 3 or more.  

Here is the conference meeting location and the schedule for ULTRAPURE WATER Asia:  

Wednesday, July 4:
Marina Bay Sand Convention Center, Level 3—Meeting Rooms 3001, 3002 and 3003.
Moderator:  Mr. Paul Tan, GE Power and Water, Water & Process Technologies

9:00 AM—Welcome and Conference Introduction
9:15 AM—2012 and Beyond:  Asian Water Business Opportunities in UPW in Power, Pharmaceuticals, and Microelectronics
Mehbub Khan, Veolia Water Solutions & Technologies
9:45 AM-10:15 AM—Tea Break/Networking
10:15 AM—Sustainable Water Supply - Water, Energy and Waste Nexus
Harry Seah, Singapore PUB
10:45 AM—Asian Water Market and Technology Development Trends
Christina Fang, Dow Water & Process Solutions (South Korea)
11:15 AM— Overview of World Water Markets
Mike Henley, ULTRAPURE WATER
11:45 AM-1: 15 PM—Lunch
1:15 PM—Desalination Market and Technology Trends and Opportunities
Nikolay Voutchkov, Water Globe Consulting
1:45 PM— An Introduction to the ITRS and SEMI Guidelines as they Relate to Semiconductor-Grade Water Requirements
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
2:15 PM—Closed Circuit Desalination for Water Reuse and Low Salinity Water Treatment
Richard Stover, Desalitech, Ltd.
2:45 PM— The Development of a New Non-Light Scattering Particle Counter and its Potential Use for Risk Mitigation to meet ITRS and SEMI Guidelines for Semiconductor UPW
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
3:15-3:45 PM—Tea Break/Networking
3:45 PM— Challenges of Recycling Cooling Tower Blowdown to a Power Plant
Joseph Lander and Michael Chan, Duraflow
4:15 PM— Inlet Distribution Design for an Improved and Robust Condensate Polisher System
Davis Yohanes Arifin and Govindan Alagappan, Siemens Water Technologies
4:45 PM—Day 1 Concludes

Thursday, July 5
Marina Bay Sand Convention Center, Level 3—Meeting Rooms 3001, 3002 and 3003.
Moderator:  Mr. Rajiv Dixit, Hyflux

9:00 AM—Introductory Remarks by Mr. Dixit
9:15 AM—Progress in RO Membranes and O&M to Mitigate Fouling
Yasushi Maeda, Dow Water & Process Solutions
9:45 AM—Expanding Operational Envelopes of the Electrodeionization Technology
Vladimir Pavlovic and John Barber, GE Water & Process Technologies
10:15-10:45 AM—Tea Break/Networking
10:45 AM—Innovations for Direct UV-Oxidation in Semiconductor Applications
Lukas Staub, Roger Schmid, and Morris Teo, SWAN Analytische Instruments AG
11:15 AM— Performance Qualified UV System Using in PW Treatment and Distribution
Ying Xu, Andrew Clark, and John Ryan, Hanovia Ltd.
11:45-1:15 PM—Lunch Break
1:15 PM—Ion-Exchange Resin Technology for High-Purity Water Production
Katsuya Takuwa, Dow Chemical Japan Ltd.
1:45 PM—25-Nanometer Optical Particle Counting Technology for High Purity Water Applications
William L. Shade, Jr., Lighthouse Worldwide Solutions
2:15 PM— Saving Energy and Chemicals via Upgrading RO Elements in an Ultrapure Water System
Andy W.C. Chow, Joseph S.M. Wang, and Chun-ju Chen, Taiwan Semiconductor Manufacturing Co. Ltd.; and Ronald Wen-Jung Chang, Dow Chemical Taiwan Ltd.
2:45 PM—Tea Break/Networking
3:00 PM—Low-Pressure, Dual-Function Membrane Pretreatment To Enhance High Brackish Water Desalination System Performance
Ivy Chua, Richard Woodling, Ph.D., and Gao Yonggang, Siemens Pte. Ltd.
3:30 PM— Electricity Generation from Acidific and Alkaline Waste Effluent
Rongaiang Fu and Keehoe Ng, Siemens Pte. Ltd.
4:00 PM—Conference Concludes