UPW Asia Will Highlight High-Purity and Industrial Water Treatment

June 25, 2012 - PRLog -- SINGAPORE—Attenders of ULTRAPURE WATER Asia 2012 (UPW Asia) will have the chance to network with others involved in high-purity water treatment, as well as learn more about treatment technologies critical to successful operation of industrial facilities.  Registration is open for the July 4-5 conference will be co-located at Singapore International Water Week (SIWW), to be held at the Marina Bay Sands Conference Centre here.  

The conference will begin with Business Forum presentations that will focus on the water business.  The meeting will feature a keynote address by Mr. Harry Seah on water development in Singapore.  He is the director of the Technology and Water Quality Office in the Singapore PUB.  Other Business Forum speakers will include Mr. Mehbub Khan, of Veolia Water, Ms. Christina Fang of Dow Water & Process Solutions, Mr. Nikolay Voutchkov, president of Water Globe Consulting, and Mr. Mike Henley, editor of ULTRAPURE WATER journal.  

The UPW Technology Forum, to be the afternoon of Wednesday, July 4, and Thursday, July 5, will feature presentations on key high-purity water treatment technologies by experts in the field.  Presentations will examine topics such as UV Oxidation, Membranes, Semiconductor Water Guidelines, Ultrafiltration, Particle Measurement, Desalination, Cooling Water.  These topics will address high-purity water treatment concerns in the semiconductor, power generation, and pharmaceutical industries.

Conference attendees can expect to learn more about the high-purity water business.  Other takeaways from the conference will include water industry trends, greater knowledge about important technologies used in high-purity water treatment, and water technology developments.

The conference is sponsored by Tall Oaks Publishing, publisher of ULTRAPURE WATER journal and INDUSTRIAL WATER TREATMENT.  Conference information and on-line registration are available at www.ultrapurewater.com.  For questions, contact info@talloaks.com,  or call 303/973-6700.  Group discounts are available when 3 or more participants from the same company register at the same time.  On-line registration is available at http://www.ultrapurewater.com/zencart/Index.php.

Here is the schedule for ULTRAPURE WATER Asia 2012:

Wednesday, July 4:
Marina Bay Sand Convention Center, Level 3—Meeting Rooms 3001, 3002 and 3003.
Moderator:  Mr. Paul Tan, GE Power and Water, Water & Process Technologies

9:00 AM—Welcome and Conference Introduction
9:15 AM—2012 and Beyond:  Asian Water Business Opportunities in UPW in Power, Pharmaceuticals, and Microelectronics
Mehbub Khan, Veolia Water Solutions & Technologies
9:45 AM-10:15 AM—Tea Break/Networking
10:15 AM—Sustainable Water Supply - Water, Energy and Waste Nexus
Harry Seah, Singapore PUB
10:45 AM—Asian Water Market and Technology Development Trends
Christina Fang, Dow Water & Process Solutions (South Korea)
11:15 AM— Overview of World Water Markets
Mike Henley, ULTRAPURE WATER
11:45 AM-1: 15 PM—Lunch
1:15 PM—Desalination Market and Technology Trends and Opportunities
Nikolay Voutchkov, Water Globe Consulting
1:45 PM— An Introduction to the ITRS and SEMI Guidelines as they Relate to Semiconductor-Grade Water Requirements
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
2:15 PM—Closed Circuit Desalination for Water Reuse and Low Salinity Water Treatment
Richard Stover, Desalitech, Ltd.
2:45 PM— The Development of a New Non-Light Scattering Particle Counter and its Potential Use for Risk Mitigation to meet ITRS and SEMI Guidelines for Semiconductor UPW
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
3:15-3:45 PM—Tea Break/Networking
3:45 PM— Challenges of Recycling Cooling Tower Blowdown to a Power Plant
Joseph Lander and Michael Chan, Duraflow
4:15 PM— Inlet Distribution Design for an Improved and Robust Condensate Polisher System
Davis Yohanes Arifin and Govindan Alagappan, Siemens Water Technologies
4:45 PM—Day 1 Concludes

Thursday, July 5
Marina Bay Sand Convention Center, Level 3—Meeting Rooms 3001, 3002 and 3003.
Moderator:  Mr. Rajiv Dixit, Hyflux

9:00 AM—Introductory Remarks by Mr. Dixit
9:15 AM—Progress in RO Membranes and O&M to Mitigate Fouling
Yasushi Maeda, Dow Water & Process Solutions
9:45 AM—Expanding Operational Envelopes of the Electrodeionization Technology
Vladimir Pavlovic and John Barber, GE Water & Process Technologies
10:15-10:45 AM—Tea Break/Networking
10:45 AM—Innovations for Direct UV-Oxidation in Semiconductor Applications
Lukas Staub, Roger Schmid, and Morris Teo, SWAN Analytische Instruments AG
11:15 AM— Performance Qualified UV System Using in PW Treatment and Distribution
Ying Xu, Andrew Clark, and John Ryan, Hanovia Ltd.
11:45-1:15 PM—Lunch Break
1:15 PM—Ion-Exchange Resin Technology for High-Purity Water Production
Katsuya Takuwa, Dow Chemical Japan Ltd.
1:45 PM—25-Nanometer Optical Particle Counting Technology for High Purity Water Applications
William L. Shade, Jr., Lighthouse Worldwide Solutions
2:15 PM— Saving Energy and Chemicals via Upgrading RO Elements in an Ultrapure Water System
Andy W.C. Chow, Joseph S.M. Wang, and Chun-ju Chen, Taiwan Semiconductor Manufacturing Co. Ltd.; and Ronald Wen-Jung Chang, Dow Chemical Taiwan Ltd.
2:45 PM—Tea Break/Networking
3:00 PM—Low-Pressure, Dual-Function Membrane Pretreatment To Enhance High Brackish Water Desalination System Performance
Ivy Chua, Richard Woodling, Ph.D., and Gao Yonggang, Siemens Pte. Ltd.
3:30 PM— Electricity Generation from Acidific and Alkaline Waste Effluent
Rongaiang Fu and Keehoe Ng, Siemens Pte. Ltd.
4:00 PM—Conference Concludes

*More information is available at http://www.ultrapurewater.com.