River Edge, NJ – Halocarbon Products Corporation, a leading worldwide producer of specialty fluorochemicals, continues to make advancements in the development of fluoro-substituted monomers. Photoresists made from polymerization of certain types of fluoro-substituted monomers are essential for the production of micro semiconductor patterns.
These monomers include hexafluorosubstituted pentenols, pentenediols, hexenols, heptenols, heptenediols, hydroxy norbornenes and acrylate and methacrylate derivatives of these compounds, according to Dr. Neville Pavri, a research chemist with Halocarbon. “These monomers have been shown to exhibit very desirable properties for 197nm and 157nm photolithography, the desirable wavelengths for micro patterns in silicon wafers used for semiconductors,”
“A critical component of the chemistry used to produce these advanced photoresists is the reactivity of hexafluoroacetone (HFA). The actual monomers used to synthesize newer photoresists are derivatives of the fluoroalkenols prepared via the reaction of various alkenes with HFA or other fluorinated ketones.”
Continued Dr. Pavri, “Because these monomers are also highly fluorinated, when incorporated into the photoresist resin they exhibit high transparency at 157nm wavelength. In addition, the fluorine in the monomer contributes to enhanced etch resistance so that the coating better withstands the substrate etching process.”
