WESI Technology Ltd (www.wesitechnology.com)
WESI integrates processing tools from the most established partners, such as Tegal for Dry Etch, Deep Reactive Ion Etch (DRIE) and PVD; memsstar® for Dry Release Etching and Surface Modification;
WESI will share its in-depth knowledge of wafer processing as well as extensive work experiences in wafer fabs with our customers, to guide customers making the best decisions for MEMS manufacturing. Collectively, WESI’s staffs have over a dozen US patents related to wafer processing as well as decades of experience in servicing fab equipment.
“Regardless of the customer’s level of experience and budget size, we can provide the optimal standalone or integrated tool package and help the customer start production effortlessly in the shortest possible time,” commented Dr. Chenting Lin, WESI’s director. “Our involvement does not stop at launching a new line. We continue to advise customers to progressively improve their yields and adapt new technologies.”



