The new TEM window array devices enable the end users to conduct multiple analyses in-situ on a single TEM nitride membrane device, which increases the throughput significantly.
The TA301 series TEM nitride window array device (see photo on left) has nine individual membrane windows in a 3x3 array pattern on a single 200µm thickness silicon frame. The silicon frame is octagon shaped and fits inside a 3mm diameter circle. Each silicon nitride window of the 3x3 array is 100µm by 100µm in size, and the spacing between two adjacent windows is 350µm (edge to edge).
"We use the TEM window arrays from Norcada in our investigation of amorphous silicon and germanium crystallization process using dynamic TEM imaging method with nanosecond temporal resolution,”
“We are very pleased with the positive impact our new TEM window array devices are having for our customers,” said Yuebin Ning, Vice President Research & Development of Norcada. “The addition of the TEM window arrays further complements our product offerings in the area of TEM silicon nitride windows for TEM Analysis studies.”
The initial devices being offered have a 100nm thickness low stress silicon nitride membrane (part number TA301C). Additional TEM devices with 30nm and 50nm thickness silicon nitride membranes will become available shortly.
