Rogue Valley Microdevices is pleased to announce the completion of their new Metal Foundry

PRLog (Press Release) - Jan 12, 2009 -
USA - Medford, OR, – [Jan 2, 2009] – Rogue Valley Microdevices is pleased to announce the completion of their new Metal Foundry. Already known for a comprehensive offering of thermal and chemical vapor depositions, Rogue Valley Microdevices is now adding physical vapor depositions (PVD) to their product lineup. PVD Metal and Dielectric film deposition capabilities will allow Rogue Valley Microdevices to satisfy MOS and MEMS process requirements.

To accommodate the addition of an E-Beam Evaporator and a DC Magnetron Sputtering System an additional 1000 square feet of cleanroom space was added to their existing facility.  Rogue Valley Microdevices also added a suite of metrology equipment essential for measuring the physical and electrical properties of the PVD films.

“I am very proud of the new processes we have introduced,” said CEO Jessica Gomez. “These new PVD films will help us to provide a more comprehensive thin films product portfolio for our customers.”

Rogue Valley Microdevices will now be able to offer a variety of sputtered films including Chromium, Aluminum, Copper, Titanium, Tantalum Nitride, Silicon Dioxide, and Silicon Nitride.  The addition of an E-beam Evaporator is also exciting because it provides customers with much greater flexibility.  Evaporated films now being added to the company’s growing list of services include Platinum, Gold, Chrome, Titanium and many others that can be deposited in a multitude of combinations.  With these new capabilities, Rogue Valley Microdevices will continue to offer world class products and services to their customers.

Founded in 2003, Rogue Valley Microdevices(www.roguevalleymicro.com) is the first company to establish a microelectronics manufacturing facility in Southern Oregon. Headquartered in Medford Oregon, Rogue Valley Microdevices is dedicated to providing high quality manufacturing and engineering services for their customers at an affordable price.

Rogue Valley Microdevices has become a leader in delivering high quality thin film products and services to the Semiconductor, MEMS, and Solar community. Rogue Valley Microdevices maintains a facility that is capable of handling high volume manufacturing but flexible enough to process wafers from 25mm to 300mm in diameter.

Rogue Valley Microdevices offers a variety of processes, including Low Stress LPCVD Nitride, PECVD Oxide, PECVD Nitride, PECVD Silicon Carbide, Thermal Oxidation, Chlorinated Oxidation, N2/H2 Annealing, and a variety of PVD films to satisfy their customer’s needs.